Yanwen (Julia) Fei

Previous Work

Prior to joining the firm, Ms. Fei was a technical specialist at an Alexandria, Virginia IP law firm, where she drafted and prosecuted patent applications in electrical arts. She has experience in various technologies which include processors, storage devices, video processing technologies, wireless communication, switching devices, printing devices, LED lighting devices, flash memory devices, and semiconductor manufacturing technology.

Yanwen was a Ph.D. candidate at Carnegie Mellon University doing research in IC design for manufacturing and testing. She established a product-based methodology for process-induced variation characterization. In addition, she developed techniques for industrial data analysis to extract process-induced variations, which utilized spatial and temporal frequency analysis and physical sensitivity analysis to decompose a convoluted wafer map into elemental process variation wafer maps. She also created new yield models based on industrial data showing that accurate yield prediction is achievable at early stages of IC design.

Publications

• “New Yield Models for DSM Manufacturing”, International Electron Devices Meeting, 2000, pp. 845-848.
• “Benchmarking Diagnosis Algorithms with a Diverse Set of IC Deformations”, International Test Conference, 2004, pp. 508-517.
• US Patent No.7,348,594.

Life Beyond the Law

Outside work, Yanwen enjoys hiking with her lovely Yorkie.